This inventor holds 79 USPTO granted patents and 22 published patent applications, primarily in Plasma Processing (CPC class H01J). Top assignees: Tokyo Electron Limited, Tohoku University, Tokyo Electron Limi Ted. Active years: 2006-2026.
Inventors with similar research interests:
Location History:
- Nirasaki, JP (2006 - 2024)
- Yamanashi, JP (2015 - 2024)
Company Filing History:
77 out of 10,862 
2 out of 1,049 
1 out of 103 Years Active: 2006-2026
Areas of Expertise:
Title: Taro Ikeda: Innovating in Plasma Processing Technologies
Introduction
Taro Ikeda, an accomplished inventor based in Nirasaki, Japan, is renowned for his significant contributions to the field of plasma processing. With a remarkable portfolio of 58 patents to his name, Ikeda's innovations have advanced the methods and apparatuses used in this domain. His work continues to influence various applications in semiconductor manufacturing and material processing.
Latest Patents
Among his latest patents, Ikeda introduces a **plasma measurement method** that enhances the precision of measuring plasma states. This method involves utilizing a probe device during plasma processing on a substrate, enabling the analysis of pulsed plasma generated through electromagnetic waves. The technique applies an AC voltage to the pulsed plasma and measures data, including current values, to assess the state of the plasma accurately by analyzing the collected data. This innovative approach ensures that the data required for pulsated plasma measurement is acquired within a designated timeframe, optimizing the process efficiency.
Additionally, his patent on the **plasma processing apparatus and plasma processing method** describes an advanced chamber structure designed for effective plasma generation. The apparatus features a microwave transmission window and a shower plate that separates the plasma generation space from the processing space. Moreover, the inclusion of a protrusion with a conductor enhances the efficiency of plasma generation, showcasing Ikeda's ingenuity in creating more sophisticated plasma processing environments.
Career Highlights
Ikeda has had a prolific career, demonstrating his innovative spirit through various roles. He has notably worked at **Tokyo Electron Limited**, a prominent company in the semiconductor equipment industry, where he contributed substantially to the development of plasma processing technologies. Additionally, his experience at **Tohoku University** speaks to his academic and research-oriented background, further solidifying his reputation as a leading figure in plasma science.
Collaborations
Throughout his career, Taro Ikeda has collaborated with notable individuals like Eiki Kamata and Yuki Osada. These partnerships have fostered an environment of innovation and knowledge-sharing, crucial for advancing research and development in plasma processing and related technologies.
Conclusion
Taro Ikeda's contributions to plasma processing through his patents and collaborative efforts have significantly impacted the field. His innovative methodologies and advanced apparatus designs continue to drive progress in the industry, positioning him as a key inventor whose work is likely to inspire future developments in plasma technology.