The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Sep. 25, 2020
Tokyo Electron Limited, Tokyo, JP;
Satoshi Itoh, Yamanashi, JP;
Masashi Imanaka, Yamanashi, JP;
Eiki Kamata, Yamanashi, JP;
Taro Ikeda, Yamanashi, JP;
Shigenori Ozaki, Osaka, JP;
Soudai Emori, Yamanashi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus that converts a gas supplied into a processing container into a plasma to process a substrate, the plasma processing apparatus including: a microwave introduction window disposed in each of a plurality of openings formed in a ceiling wall of the processing container, the microwave introduction window being configured to supply power of microwaves into the processing container; and a plurality of grooves formed on the ceiling wall to surround the openings respectively, wherein widths between the grooves and the openings are not uniform with respect to circumferential directions of the openings.