Satoshi Itoh

Title: Satoshi Itoh: Innovator in Plasma Processing Technology

Introduction

Satoshi Itoh is a prominent inventor based in Nirasaki, Japan, known for his contributions to plasma processing technology. With a total of three patents to his name, he has made significant advancements in the field, particularly in the design and functionality of plasma processing apparatuses.

Latest Patents

Satoshi Itoh's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus is designed to convert gas supplied into a processing container into plasma for substrate processing. It features a microwave introduction window in multiple openings of the processing container's ceiling wall, allowing for efficient microwave power supply. Additionally, the apparatus includes grooves surrounding the openings, which vary in width to enhance processing capabilities. The plasma processing method involves controlling the intensity of power from multiple plasma sources to generate plasma and deposit films on substrates, ensuring desired film stress on both surfaces.

Career Highlights

Satoshi Itoh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work focuses on developing innovative solutions that enhance plasma processing techniques, contributing to advancements in various technological applications.

Collaborations

Satoshi collaborates with notable colleagues such as Soudai Emori and Masashi Imanaka, who share his commitment to innovation in plasma processing technology.

Conclusion

Satoshi Itoh's work in plasma processing technology exemplifies the impact of innovative thinking in the field. His patents and contributions continue to shape the future of semiconductor manufacturing and related industries.