The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Sep. 06, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hirokazu Kyokane, Yamanashi, JP;

Hidefumi Matsui, Yamanashi, JP;

Toshiyuki Fukumoto, Yamanashi, JP;

Satoshi Itoh, Yamanashi, JP;

Masashi Imanaka, Yamanashi, JP;

Toyohisa Tsuruda, Yamanashi, JP;

Masashi Enomoto, Yamanashi, JP;

Masahiro Yanagisawa, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01); G06T 7/60 (2017.01);
U.S. Cl.
CPC ...
G01B 11/0616 (2013.01); G06T 7/60 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A substrate processing apparatus includes: an imaging portion configured to acquire a surface image of a film formed on a surface of a substrate; an optical property estimation portion configured to estimate an optical property of the film based on process information acquired during formation of the film; and a film thickness estimation portion configured to estimate a film thickness of the film based on the surface image and an estimation result of the optical property.


Find Patent Forward Citations

Loading…