Yamanashi, Japan

Hirokazu Kyokane

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hirokazu Kyokane: Innovator in Substrate Processing Technology

Introduction

Hirokazu Kyokane is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a patented apparatus that enhances the efficiency and accuracy of substrate processing.

Latest Patents

Hirokazu Kyokane holds a patent for a "Substrate processing apparatus, substrate processing method, and storage medium." This invention includes an imaging portion that acquires a surface image of a film formed on a substrate's surface. Additionally, it features an optical property estimation portion that estimates the optical properties of the film based on process information acquired during its formation. Furthermore, a film thickness estimation portion estimates the film thickness based on the surface image and the optical property estimation results. This patent showcases his expertise in advancing substrate processing technologies.

Career Highlights

Kyokane is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in developing cutting-edge technologies that improve substrate processing methods. His dedication to innovation has positioned him as a key figure in his field.

Collaborations

Hirokazu Kyokane has collaborated with notable colleagues, including Hidefumi Matsui and Toshiyuki Fukumoto. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Hirokazu Kyokane's contributions to substrate processing technology exemplify his commitment to innovation and excellence. His patented inventions and collaborations with esteemed colleagues highlight his significant impact on the industry. His work continues to influence advancements in substrate processing methods, paving the way for future innovations.

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