The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Mar. 07, 2023
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Joji Takayoshi, Miyagi, JP;
Hidehiko Sato, Miyagi, JP;
Yuri Kimura, Miyagi, JP;
Hirokazu Kyokane, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract
An etching processing system includes a memory, and a processor coupled to the memory and configured to predict etching quality of a substrate by inputting image data of the substrate into a trained model trained by using training data in which image data of substrates captured by an imaging device arranged on a transfer path of the substrates and information for predicting etching quality of the substrates are associated with each other.