Miyagi, Japan

Yuri Kimura

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Yuri Kimura

Introduction

Yuri Kimura is an accomplished inventor based in Miyagi, Japan, recognized for his cutting-edge contributions to substrate processing technology. With one patented innovation under his belt, he has made significant strides in improving the efficiency and accuracy of substrate processing.

Latest Patents

Yuri Kimura's patent, titled "Substrate Processing Apparatus and Substrate Transfer Position Adjustment Method," introduces a sophisticated mechanism that enhances the etching process of substrates. The apparatus comprises a processing module featuring a stage with dual surfaces for optimal substrate placement. It also includes an edge ring on the second surface and a measurement unit to ascertain etching rates throughout the substrate. Notably, the controller in this system dynamically adjusts substrate transfer positions, ensuring precise measurements and generating approximate curves for effective processing.

Career Highlights

Kimura is currently leveraging his expertise at Tokyo Electron Limited, a company renowned for its innovation in semiconductor manufacturing and production equipment. His work primarily focuses on optimizing substrate processing techniques, contributing to the advancement of semiconductor technology.

Collaborations

Throughout his career, Yuri has collaborated with talented individuals such as Joji Takayoshi and Hidehiko Sato. Together, their combined knowledge and skills create a dynamic environment that fosters innovation and progress in their field.

Conclusion

Yuri Kimura stands out as a pivotal figure in the realm of substrate processing, with his patent illuminating the path for future advancements in the industry. As he continues to push the boundaries of technology at Tokyo Electron Limited, the impact of his work is sure to be felt for years to come.

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