Masashi Imanaka

Title: Masashi Imanaka: Innovator in Substrate Processing Technology

Introduction

Masashi Imanaka is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing, holding a total of four patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Imanaka's latest patents include a substrate processing apparatus and method, as well as a storage medium. The substrate processing apparatus features an imaging portion that acquires surface images of films formed on substrates. It also includes an optical property estimation portion that estimates the optical properties of the film based on process information. Additionally, a film thickness estimation portion is designed to estimate the film thickness based on the surface image and the optical property estimation results. Another notable patent is for a plasma processing apparatus that converts gas into plasma for substrate processing. This apparatus includes a microwave introduction window and a series of grooves on the ceiling wall of the processing container, which are designed to optimize the plasma processing environment.

Career Highlights

Masashi Imanaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His innovative work has positioned him as a key figure in the development of substrate processing technologies.

Collaborations

Imanaka has collaborated with notable colleagues such as Satoshi Itoh and Toshio Nakanishi. Their combined expertise has contributed to advancements in substrate processing technologies.

Conclusion

Masashi Imanaka's contributions to substrate processing technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.