The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
Jun. 11, 2013
Tokyo Electron Limited, Tokyo, JP;
Taro Ikeda, Nirasaki, JP;
Yutaka Fujino, Nirasaki, JP;
Hikaru Adachi, Nirasaki, JP;
Hiroyuki Miyashita, Nirasaki, JP;
Yuki Osada, Nirasaki, JP;
Nobuhiko Yamamoto, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus () includes a processing container () and a microwave introduction device () having a plurality of microwave introduction modules (). A microwave is introduced for each of the plurality of microwave introduction modules (), and S-parameters for each of combinations of the plurality of microwave introduction modules () are obtained based on the introduced microwave and a reflected microwave reflected from the processing container () into the plurality of microwave introduction modules ().