Nirasaki, Japan

Akira Tanihara


Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Yamanashi, JP (2017)
  • Nirasaki, JP (2017 - 2019)

Company Filing History:


Years Active: 2017-2019

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3 patents (USPTO):Explore Patents

Title: Akira Tanihara: Innovator in Plasma Technology

Introduction

Akira Tanihara is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma technology, holding a total of 3 patents. His work primarily focuses on microwave plasma sources and their applications in semiconductor manufacturing.

Latest Patents

Tanihara's latest patents include a microwave plasma source and a plasma processing apparatus. The microwave plasma source is designed to form a surface wave plasma by radiating microwaves into a chamber of a plasma processing apparatus. This innovative design features a microwave output part, a microwave transmission part, and a microwave radiation member. The microwave transmission part consists of multiple microwave introduction mechanisms arranged circumferentially around the microwave radiation member. The radiation member itself is constructed from a metal main body and includes dielectric slow-wave members and an annular dielectric microwave transmission member. Additionally, a slot antenna part is installed between the slow-wave members and the microwave transmission member.

Another significant patent involves a method for forming a fluorocarbon-based insulating film in contact with metal. This method utilizes microwave irradiation on metal surfaces that have moisture in a hydrogen-containing atmosphere, followed by plasma CVD using a fluorocarbon-based gas to create the insulating film.

Career Highlights

Akira Tanihara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in plasma technology.

Collaborations

Tanihara has collaborated with notable colleagues, including Shigeru Kasai and Taro Ikeda. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Akira Tanihara's contributions to plasma technology and semiconductor manufacturing are noteworthy. His innovative patents and collaborative efforts continue to influence the industry positively.

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