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For the Inventor, By the Inventor

Nirasaki, Japan

Yasuo Kobayashi

This inventor holds 24 USPTO granted patents, primarily in Semiconductor Processing. Top assignees: Tokyo Electron Limited, Zeon Corporation, Other. Active years: 1994-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Kobayashi. Retrieved from https://idiyas.com/inventor/yasuo-kobayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24

% Patents Active = 54.2

Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 657(Granted Patents)


Location History:

  • Yamanashi-ken, JP (1998 - 2001)
  • Nirasaki, JP (1994 - 2020)
  • Yamanashi, JP (2014 - 2021)

Company Filing History:

goldMedal23 out of 10,933 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 1,297 
 
Zeon Corporation
 patents
bronzeMedal4 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1994-2021

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Areas of Expertise:
Film Forming
Plasma Processing
Surface Treatment
Substrate Processing
CVD
Sputtering
Semiconductor Device
Oxide Film Removal
Titanium Film
Barrier Film
Processing Apparatus
Cleaning Method
24 patents (USPTO):Explore Patents
1. 11171014 - Substrate processing method and substrate processing apparatus (2021-11-09),
2. 10626496 - Film forming apparatus, method of cleaning film forming apparatus, and storage medium (2020-04-21),
3. 10438791 - Film forming method, film forming apparatus, and storage medium (2019-10-08),
4. 10388557 - Placing bed structure, treating apparatus using the structure, and method for using the apparatus (2019-08-20),
5. 9177846 - Placing bed structure, treating apparatus using the structure, and method for using the apparatus (2015-11-03),
6. 8765605 - Surface treatment for a fluorocarbon film (2014-07-01),
7. 8398813 - Processing apparatus and processing method (2013-03-19),
8. 8017197 - Plasma processing method and plasma processing apparatus (2011-09-13),
9. 7897205 - Film forming method and film forming apparatus (2011-03-01),
10. 7803705 - Manufacturing method of semiconductor device and film deposition system (2010-09-28),
11. 7776736 - Substrate for electronic device capable of suppressing fluorine atoms exposed at the surface of insulating film from reacting with water and method for processing same (2010-08-17),
12. 7704893 - Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD (2010-04-27),
13. 7521324 - Semiconductor device and method for manufacturing the same (2009-04-21),
14. 7146744 - Method and apparatus for surface treatment (2006-12-12),
15. 7094703 - Method and apparatus for surface treatment (2006-08-22),

Title: Inventor Yasuo Kobayashi

Introduction: Yasuo Kobayashi is a renowned inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Yasuo Kobayashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: Throughout his career, Kobayashi has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized the industry. His dedication to pushing the boundaries of technology has earned him recognition as a pioneer in his field.

Collaborations: Kobayashi has collaborated with top companies in Japan and internationally, fostering partnerships that have led to the successful implementation of his inventions in real-world applications. His ability to work effectively in multidisciplinary teams has been instrumental in his success.

Conclusion: In conclusion, Yasuo Kobayashi's passion for innovation and his relentless pursuit of excellence have solidified his position as a prominent figure in the world of inventions. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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