The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Oct. 31, 2007
Yasuo Kobayashi, Nirasaki, JP;
Masao Yoshioka, Nirasaki, JP;
Yasuo Kobayashi, Nirasaki, JP;
Masao Yoshioka, Nirasaki, JP;
Tokyo Electron Limited, Minato-Ku, Tokyo-To, JP;
Abstract
The present invention provides a processing apparatus and a processing method, both of which can carry out a low-temperature process to allow active gas species to react with an oxide film on an object to be processed to form a product film and a heating process to heat the object to a predetermined temperature to evaporate the product film, in succession. This processing apparatusis provided with a shielding platecapable of entering a gap between the object W and a transparent windowand also withdrawing from the gap. On condition that the shielding plateis closed to cut off irradiation heat from the transparent windowthe product film is formed by allowing the active gas species of NFgas to react with a native oxide film on the object under the low-temperature condition. After that, upon closing the shielding platethe native oxide film is removed by applying heat irradiated from a heating lampto the product film through the transparent windowAdditionally, the apparatus includes a low-temperature processing chamberallowing NFgas to react with the native oxide film at a low temperature and a heating chamberfor heating the product film, independently.