The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Feb. 18, 2008
Noriaki Fukiage, Amagasaki, JP;
Shinji Komoto, Amagasaki, JP;
Hiroyuki Takaba, Hillsboro, OR (US);
Kiyotaka Ishibashi, Amagasaki, JP;
Noriaki Fukiage, Amagasaki, JP;
Shinji Komoto, Amagasaki, JP;
Hiroyuki Takaba, Hillsboro, OR (US);
Kiyotaka Ishibashi, Amagasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
A method of cleaning a plasma processing apparatus for processing a target in a process container, which is vacuum-evacuatable, using plasma, includes performing a first cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a first pressure, and performing a second cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a second pressure that is higher than the first pressure. Accordingly, the plasma processing apparatus can be efficiently and rapidly cleaned without damaging at least one of the group consisting of inner surfaces of the process container and members in the process container.