The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2014

Filed:

Sep. 26, 2007
Applicants:

Masahiro Okesaku, Komatsu, JP;

Tadahiro Ohmi, Sendai, JP;

Tetsuya Goto, Sendai, JP;

Takaaki Matsuoka, Sendai, JP;

Toshihisa Nozawa, Amagasaki, JP;

Atsutoshi Inokuchi, Sendai, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Inventors:

Masahiro Okesaku, Komatsu, JP;

Tadahiro Ohmi, Sendai, JP;

Tetsuya Goto, Sendai, JP;

Takaaki Matsuoka, Sendai, JP;

Toshihisa Nozawa, Amagasaki, JP;

Atsutoshi Inokuchi, Sendai, JP;

Kiyotaka Ishibashi, Amagasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); C23C 16/45568 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32477 (2013.01); H01J 37/3255 (2013.01);
Abstract

A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.


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