Company Filing History:

6 out of 10,295

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2011-2022

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11495439 - Plasma processing apparatus (2022-11-08),

2. 9767994 - Shower plate sintered integrally with gas release hole member and method for manufacturing the same (2017-09-19),

3. 9378942 - Deposition method and deposition apparatus (2016-06-28),

4. 8915999 - Shower plate sintered integrally with gas release hole member and method for manufacturing the same (2014-12-23),

5. 8592810 - Thin film, method of forming the same, and semiconductor light-emitting element comprising the thin film (2013-11-26),

6. 8188468 - Compound-type thin film, method of forming the same, and electronic device using the same (2012-05-29),

7. 7923819 - Interlayer insulating film, wiring structure and electronic device and methods of manufacturing the same (2011-04-12),

Title: The Innovations of Atsutoshi Inokuchi

Introduction

Atsutoshi Inokuchi is a prominent inventor based in Kurokawa-gun, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of seven patents. His work has advanced the capabilities of plasma processing apparatuses, which are essential in various industrial applications.

Latest Patents

One of Inokuchi's latest patents is a plasma processing apparatus designed for etching workpieces. This apparatus includes a container, a gas supply system for processing gas, a plasma source for exciting the gas, and a support for holding the workpiece. Additionally, it features an exhaust system, electrode plates on the container's inner wall, insulators for electrical insulation, a DC power supply for voltage application, and a controller for managing the system's operations. The controller ensures that the DC voltage is applied to each electrode plate during or after the etching process.

Another notable patent is for a shower plate that is sintered integrally with a gas release hole member. This shower plate is utilized in a plasma processing apparatus, where plasma excitation gas is released into the processing chamber to generate plasma. The invention includes a ceramic member with multiple gas release holes and a porous gas-communicating body, which are sintered and bonded to facilitate efficient gas release.

Career Highlights

Inokuchi has worked with notable organizations such as Tokyo Electron Limited and Tohoku University. His experience in these institutions has allowed him to refine his expertise in plasma processing technologies and contribute to innovative solutions in the field.

Collaborations

Inokuchi has collaborated with esteemed colleagues, including Tadahiro Ohmi and Takaaki Matsuoka. Their joint efforts have further propelled advancements in plasma processing technology.

Conclusion

Atsutoshi Inokuchi's contributions to plasma processing technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative solutions continue to impact various industries, showcasing the importance of his work.

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