The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Feb. 11, 2014
Tokyo Electron Limited, Tokyo, JP;
Kazushi Kaneko, Sendai, JP;
Naoki Matsumoto, Miyagi, JP;
Koji Koyama, Miyagi, JP;
Kazunori Funazaki, Miyagi, JP;
Hideo Kato, Miyagi, JP;
Kiyotaka Ishibashi, Sendai, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a plasma generating device configured to generate a plasma within a processing vessel by using a high frequency wave generated by a microwave generatorincluding a magnetronconfigured to generate the high frequency wave; detectorsandconfigured to measure a power of a traveling wave that propagates to a load side and a power of a reflected wave reflected from the load side, respectively; and a voltage control circuitconfigured to control a voltage supplied to the magnetronby a power supply. Further, the voltage control circuitincludes a load control device configured to supply, to the magnetron, a voltage corresponding to a power calculated by adding a power calculated based on the power of the reflected wave measured by the detectorto the power of the traveling wave measured by the detector