The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Jul. 14, 2011
Masaki Hirayama, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
Masaki Hirayama, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
TOHOKU UNIVERSITY, Sendai-Shi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus can excite uniform plasma on a large substrate. The plasma processing apparatusincludes a vacuum chamberhaving therein a mounting tableconfigured to mount a substrate G, and a plasma space, formed above the mounting table, in which plasma is generated; a first coaxial waveguidethrough which a high frequency power for exciting plasma is supplied into the vacuum chamber; a waveguide path, connected to the first coaxial waveguide, having a slit-shaped opening toward the plasma space; and an adjusting unit configured to adjust a wavelength of the high frequency power propagating in the waveguide path in a lengthwise direction of the slit-shaped opening. By adjusting the wavelength of the high frequency power propagating in the waveguide path to be sufficiently lengthened, uniform plasma can be excited on the large substrate.