Stan D Tsai

This inventor holds 74 USPTO granted patents and 4 published patent applications, primarily in Chemical Mechanical Polishing (CPC class B24B). Top assignee: Applied Materials, Inc.. Active years: 2001-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stan D Tsai. Retrieved from https://idiyas.com/inventor/stan-d-tsai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 74 (Patent Applications = 4)

% Patents Active = 28.4

Average Co-Inventor Count = 5.2

ph-index = 18

Forward Citations = 1,011(Granted Patents)

Forward Citations (Not Self Cited) = 835(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

74 out of 14,433

Applied Materials, Inc.

patents

Years Active: 2001-2016

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Areas of Expertise:

Polishing Pad

Electrochemical Processing

Substrate Polishing

Pad Conditioning

Chemical Mechanical Polishing

Conductive Material

Metrology Feedback

Torque Monitoring

Multi-layer Pad

Edge Profile Control

Planarization Capability

Wear Reduction

74 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9238293 - Polishing pad edge extension (2016-01-19),

2. 9138860 - Closed-loop control for improved polishing pad profiles (2015-09-22),

3. 8758085 - Method for compensation of variability in chemical mechanical polishing consumables (2014-06-24),

4. 8337279 - Closed-loop control for effective pad conditioning (2012-12-25),

5. 8221193 - Closed loop control of pad profile based on metrology feedback (2012-07-17),

6. 8096852 - In-situ performance prediction of pad conditioning disk by closed loop torque monitoring (2012-01-17),

7. 7879255 - Method and composition for electrochemically polishing a conductive material on a substrate (2011-02-01),

8. 7842169 - Method and apparatus for local polishing control (2010-11-30),

9. 7699972 - Method and apparatus for evaluating polishing pad conditioning (2010-04-20),

10. 7678245 - Method and apparatus for electrochemical mechanical processing (2010-03-16),

11. 7654885 - Multi-layer polishing pad (2010-02-02),

12. 7582564 - Process and composition for conductive material removal by electrochemical mechanical polishing (2009-09-01),

13. 7576007 - Method for electrochemically mechanically polishing a conductive material on a substrate (2009-08-18),

14. 7569134 - Contacts for electrochemical processing (2009-08-04),

15. 7504018 - Electrochemical method for Ecmp polishing pad conditioning (2009-03-17),

Title: The Innovative Journey of Stan D Tsai

Introduction: Stan D Tsai is a renowned inventor based in Fremont, California, known for his groundbreaking contributions to various technological fields.

Latest Patents: Stan D Tsai holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise.

Career Highlights: With over two decades of experience in the tech industry, Stan D Tsai has worked for leading companies such as Tesla and Google X, where he played a key role in developing cutting-edge solutions.

Collaborations: Throughout his career, Stan D Tsai has collaborated with top researchers and engineers from prestigious universities and research institutions worldwide, fostering a culture of innovation and excellence.

Conclusion: Stan D Tsai's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and engineers.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

4 patents pending: