Stan D Tsai

This inventor holds 74 USPTO granted patents and 4 published patent applications, primarily in Chemical Mechanical Polishing (CPC class B24B). Top assignee: Applied Materials, Inc.. Active years: 2001-2016.

USPTO Granted Patents = 74 (Patent Applications = 4)

% Patents Active = 28.4

Average Co-Inventor Count = 5.2

ph-index = 18

Forward Citations = 1,011(Granted Patents)

Forward Citations (Not Self Cited) = 835(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

74 out of 14,391

Applied Materials, Inc.

patents

Years Active: 2001-2016

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Areas of Expertise:

Polishing Pad

Electrochemical Processing

Substrate Polishing

Pad Conditioning

Chemical Mechanical Polishing

Conductive Material

Metrology Feedback

Torque Monitoring

Multi-layer Pad

Edge Profile Control

Planarization Capability

Wear Reduction

74 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9238293 - Polishing pad edge extension (2016-01-19),

2. 9138860 - Closed-loop control for improved polishing pad profiles (2015-09-22),

3. 8758085 - Method for compensation of variability in chemical mechanical polishing consumables (2014-06-24),

4. 8337279 - Closed-loop control for effective pad conditioning (2012-12-25),

5. 8221193 - Closed loop control of pad profile based on metrology feedback (2012-07-17),

6. 8096852 - In-situ performance prediction of pad conditioning disk by closed loop torque monitoring (2012-01-17),

7. 7879255 - Method and composition for electrochemically polishing a conductive material on a substrate (2011-02-01),

8. 7842169 - Method and apparatus for local polishing control (2010-11-30),

9. 7699972 - Method and apparatus for evaluating polishing pad conditioning (2010-04-20),

10. 7678245 - Method and apparatus for electrochemical mechanical processing (2010-03-16),

11. 7654885 - Multi-layer polishing pad (2010-02-02),

12. 7582564 - Process and composition for conductive material removal by electrochemical mechanical polishing (2009-09-01),

13. 7576007 - Method for electrochemically mechanically polishing a conductive material on a substrate (2009-08-18),

14. 7569134 - Contacts for electrochemical processing (2009-08-04),

15. 7504018 - Electrochemical method for Ecmp polishing pad conditioning (2009-03-17),

Title: The Innovative Journey of Stan D Tsai

Introduction: Stan D Tsai is a renowned inventor based in Fremont, California, known for his groundbreaking contributions to various technological fields.

Latest Patents: Stan D Tsai holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise.

Career Highlights: With over two decades of experience in the tech industry, Stan D Tsai has worked for leading companies such as Tesla and Google X, where he played a key role in developing cutting-edge solutions.

Collaborations: Throughout his career, Stan D Tsai has collaborated with top researchers and engineers from prestigious universities and research institutions worldwide, fostering a culture of innovation and excellence.

Conclusion: Stan D Tsai's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and engineers.