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For the Inventor, By the Inventor

Boise, ID, United States of America

Scott G Meikle

This inventor holds 130 USPTO granted patents, primarily in Microelectronic Processing (CPC class B24B1-00). Top assignees: Micron Technology Incorporated, Micron Semiconductor, Inc., Round Rock Research, LLC. Active years: 1993-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Scott G Meikle. Retrieved from https://idiyas.com/inventor/scott-g-meikle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 130

% Patents Active = 72.3

Average Co-Inventor Count = 2.1

ph-index = 33

Forward Citations = 3,389(Granted Patents)

Forward Citations (Not Self Cited) = 3,166(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Gainesville, VA (US) (2006 - 2012)
  • Boise, ID (US) (1993 - 2013)

Company Filing History:

goldMedal123 out of 39,176 
 
Micron Technology Incorporated
 patents
silverMedal4 out of 156 
 
Micron Semiconductor, Inc.
 patents
bronzeMedal2 out of 428 
 
Round Rock Research, LLC
 patents
4. 1 out of 834,453 
Other
 patents

Years Active: 1993-2013

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Areas of Expertise:
Microelectronic Substrate
Conductive Material
Planarization
Chemical-Mechanical Planarization
Turbidity Monitoring
Semiconductor Processing
Electromechanical Removal
Polishing Pads
Endpoint Techniques
Stud Capacitor
Fabrication Method
Electrochemical Processing
130 patents (USPTO):Explore Patents
1. 8557132 - Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning (2013-10-15),
2. 8106438 - Stud capacitor device and fabrication method (2012-01-31),
3. 8048756 - Method for removing metal layers formed outside an aperture of a BPSG layer utilizing multiple etching processes including electrochemical-mechanical polishing (2011-11-01),
4. 8048287 - Method for selectively removing conductive material from a microelectronic substrate (2011-11-01),
5. 7972485 - Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate (2011-07-05),
6. 7838381 - Stud capacitor device and fabrication method (2010-11-23),
7. 7700436 - Method for forming a microelectronic structure having a conductive material and a fill material with a hardness of 0.04 GPA or higher within an aperture (2010-04-20),
8. 7618528 - Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate (2009-11-17),
9. 7604729 - Methods and apparatus for selectively removing conductive material from a microelectronic substrate (2009-10-20),
10. 7588677 - Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate (2009-09-15),
11. 7560017 - Methods and apparatus for electrically detecting characteristics of a microelectronic substrate and/or polishing medium (2009-07-14),
12. 7538880 - Turbidity monitoring methods, apparatuses, and sensors (2009-05-26),
13. 7530877 - Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid (2009-05-12),
14. 7374476 - Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates (2008-05-20),
15. 7367871 - Semiconductor processing methods of removing conductive material (2008-05-06),

Title: The Innovative Journey of Scott G Meikle

Introduction: Scott G Meikle is a pioneering inventor based in Boise, Idaho. With a passion for creating groundbreaking solutions, he has made significant contributions to the field of innovation.

Latest Patents: Scott G Meikle holds several patents in various industries, showcasing his diverse range of expertise and creativity. His latest patents focus on cutting-edge technologies that aim to revolutionize the way we live and work.

Career Highlights: Throughout his illustrious career, Scott G Meikle has consistently pushed the boundaries of innovation. From his early days as a budding inventor to his current status as a respected figure in the industry, he has always strived for excellence.

Collaborations: Scott G Meikle has collaborated with leading companies, research institutions, and universities to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Scott G Meikle is a visionary inventor who continues to inspire others with his groundbreaking ideas and relentless pursuit of innovation. His impact on the world of inventions is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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