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Boise, ID, United States of America

Scott G Meikle

USPTO Granted Patents = 130

Average Co-Inventor Count = 2.1

ph-index = 33

Forward Citations = 3,382(Granted Patents)

Forward Citations (Not Self Cited) = 3,166(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Gainesville, VA (US) (2006 - 2012)
Boise, ID (US) (1993 - 2013)

Company Filing History:

123 out of 37,950

Micron Technology Incorporated

Micron Semiconductor, Inc.

Round Rock Research, LLC

4. 1 out of 832,812

Other

patents

Years Active: 1993-2013

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Areas of Expertise:

Microelectronic Substrates

Chemical-Mechanical Planarization

Electrochemical Processing

Semiconductor Processing

Conductive Material Removal

Turbidity Monitoring

Planarizing Solutions

Stud Capacitor Devices

Polishing Pads

Endpoint Techniques

Inline Monitoring

Electromechanical Removal

130 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8557132 - Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning (2013-10-15),

2. 8106438 - Stud capacitor device and fabrication method (2012-01-31),

3. 8048756 - Method for removing metal layers formed outside an aperture of a BPSG layer utilizing multiple etching processes including electrochemical-mechanical polishing (2011-11-01),

4. 8048287 - Method for selectively removing conductive material from a microelectronic substrate (2011-11-01),

5. 7972485 - Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate (2011-07-05),

6. 7838381 - Stud capacitor device and fabrication method (2010-11-23),

7. 7700436 - Method for forming a microelectronic structure having a conductive material and a fill material with a hardness of 0.04 GPA or higher within an aperture (2010-04-20),

8. 7618528 - Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate (2009-11-17),

9. 7604729 - Methods and apparatus for selectively removing conductive material from a microelectronic substrate (2009-10-20),

10. 7588677 - Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate (2009-09-15),

11. 7560017 - Methods and apparatus for electrically detecting characteristics of a microelectronic substrate and/or polishing medium (2009-07-14),

12. 7538880 - Turbidity monitoring methods, apparatuses, and sensors (2009-05-26),

13. 7530877 - Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid (2009-05-12),

14. 7374476 - Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates (2008-05-20),

15. 7367871 - Semiconductor processing methods of removing conductive material (2008-05-06),

Title: The Innovative Journey of Scott G Meikle

Introduction: Scott G Meikle is a pioneering inventor based in Boise, Idaho. With a passion for creating groundbreaking solutions, he has made significant contributions to the field of innovation.

Latest Patents: Scott G Meikle holds several patents in various industries, showcasing his diverse range of expertise and creativity. His latest patents focus on cutting-edge technologies that aim to revolutionize the way we live and work.

Career Highlights: Throughout his illustrious career, Scott G Meikle has consistently pushed the boundaries of innovation. From his early days as a budding inventor to his current status as a respected figure in the industry, he has always strived for excellence.

Collaborations: Scott G Meikle has collaborated with leading companies, research institutions, and universities to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Scott G Meikle is a visionary inventor who continues to inspire others with his groundbreaking ideas and relentless pursuit of innovation. His impact on the world of inventions is truly remarkable, and his legacy will undoubtedly endure for years to come.

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