The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Nov. 06, 2007
Guy Blalock, Eagle, ID (US);
Scott Meikle, Gainesville, VA (US);
Guy Blalock, Eagle, ID (US);
Scott Meikle, Gainesville, VA (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
The present teachings relate to a method of forming a container capacitor structure on a substrate. In one embodiment, the method comprises etching a recess in the substrate, depositing a first conductive layer on the substrate so as to overlie the substrate and the recess, depositing a filler layer so as to overlie the first conductive layer and fill the recess, and etching the first and second conductive layers so as to define a lower electrode within the recess. The method further comprises forming a cap layer on the lower electrode so as to overlie the first conductive layer and the filler layer and etching at least a portion of the substrate away from the lower electrode to thereby at least partially isolate the lower electrode. Subsequently, the remainder of the capacitor structure may be formed by depositing a dielectric layer on the lower electrode and depositing a second conductive layer on the dielectric layer so as to form an upper electrode.