The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Mar. 04, 2003
Stan Tsai, Fremont, CA (US);
Feng Q. Liu, San Jose, CA (US);
Yan Wang, Sunnyvale, CA (US);
Rashid Mavliev, Campbell, CA (US);
Liang-yuh Chen, Foster City, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Stan Tsai, Fremont, CA (US);
Feng Q. Liu, San Jose, CA (US);
Yan Wang, Sunnyvale, CA (US);
Rashid Mavliev, Campbell, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Alain Duboust, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for local polishing and deposition control in a process cell is generally provided. In one embodiment, an apparatus for electrochemically processing a substrate is provided that selectively polishes discrete conductive portions of a substrate by controlling an electrical bias profile across a processing area, thereby controlling processing rates between two or more conductive portions of the substrate.