The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2009

Filed:

Jun. 14, 2006
Applicants:

Paul Butterfield, San Jose, CA (US);

Liang-yuh Chen, Foster City, CA (US);

Yongqi HU, Campbell, CA (US);

Antoine Manens, Palo Alto, CA (US);

Rashid Mavliev, Campbell, CA (US);

Stan Tsai, Fremont, CA (US);

Inventors:

Paul Butterfield, San Jose, CA (US);

Liang-Yuh Chen, Foster City, CA (US);

Yongqi Hu, Campbell, CA (US);

Antoine Manens, Palo Alto, CA (US);

Rashid Mavliev, Campbell, CA (US);

Stan Tsai, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23H 5/06 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods for electrochemically processing a substrate. A contact element defines a substrate contact surface positionable in contact a substrate during processing. In one embodiment, the contact element comprises a wire element. In another embodiment the contact element is a rotating member. In one embodiment, the contact element comprises a noble metal.


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