IDiyas

For the Inventor, By the Inventor

Shizuoka, Japan

Sou Kamimura

USPTO Granted Patents = 26 

 

Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Shizouka, JP (2009)
  • Haibara-gun, JP (2010 - 2017)
  • Shizuoka-ken, JP (2018)
  • Shizuoka, JP (2010 - 2019)

Company Filing History:

goldMedal26 out of 16,042 
 
Fujifilm Corporation
 patents

Years Active: 2009-2025

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26 patents (USPTO):
1. 12346026 - Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device (2025-07-01),
2. 10248019 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film (2019-04-02),
3. 10126653 - Pattern forming method and resist composition (2018-11-13),
4. 9897922 - Method of forming pattern and developer for use in the method (2018-02-20),
5. 9760003 - Pattern forming method and actinic-ray- or radiation-sensitive resin composition (2017-09-12),
6. 9709892 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same (2017-07-18),
7. 9551935 - Pattern forming method and resist composition (2017-01-24),
8. 9513547 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device (2016-12-06),
9. 9482958 - Method of forming pattern and developer for use in the method (2016-11-01),
10. 9223219 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film (2015-12-29),
11. 9128376 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device (2015-09-08),
12. 9116437 - Pattern forming method, chemical amplification resist composition and resist film (2015-08-25),
13. 9097973 - Method of forming pattern and developer for use in the method (2015-08-04),
14. 8999621 - Pattern forming method, chemical amplification resist composition and resist film (2015-04-07),
15. 8871642 - Method of forming pattern and developer for use in the method (2014-10-28),

Title: Sou Kamimura: Pioneering Inventor from Shizuoka, JP

Introduction: Sou Kamimura is a distinguished inventor hailing from Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Sou Kamimura holds several patents in various technological domains, showcasing his continuous commitment to pushing the boundaries of innovation.

Career Highlights: Throughout his illustrious career, Sou Kamimura has been instrumental in developing cutting-edge technologies that have revolutionized industries and improved the lives of many.

Collaborations: Sou Kamimura has collaborated with leading research institutions, universities, and companies worldwide, fostering a culture of innovation and knowledge exchange.

Conclusion: Sou Kamimura's relentless pursuit of innovation and his passion for creating impactful solutions solidify his position as a trailblazing inventor in the realm of technology.

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