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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9513547 B1

PDFFull Text
Date of Patent:
Dec. 06, 2016

Filed:

Jan. 28, 2015

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Sou Kamimura, Haibara-gun, JP;

Hidenori Takahashi, Haibara-gun, JP;

Keita Kato, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Martin Angebranndt

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/40 (2006.01); G03F 7/30 (2006.01); G03F 7/038 (2006.01); C08F 212/14 (2006.01); C08F 220/04 (2006.01); C08F 220/18 (2006.01); C08F 220/26 (2006.01); C08F 220/28 (2006.01); C08F 220/58 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); C08F 212/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 212/14 (2013.01); C08F 220/04 (2013.01); C08F 220/18 (2013.01); C08F 220/26 (2013.01); C08F 220/28 (2013.01); C08F 220/58 (2013.01); G03F 7/038 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); C08F 212/32 (2013.01);
Abstract

The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent.

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