The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Feb. 24, 2011
Kaoru Iwato, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Shinji Tarutani, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kazuyoshi Mizutani, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.