Shizuoka, Japan

Kana Fujii

USPTO Granted Patents = 17 

 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 21(Granted Patents)


Location History:

  • Haibara-gun, JP (2013 - 2017)
  • Shizuoka-ken, JP (2018)
  • Shizuoka, JP (2013 - 2019)

Company Filing History:


Years Active: 2013-2019

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17 patents (USPTO):Explore Patents

Title: Innovations of Kana Fujii

Introduction

Kana Fujii is a prominent inventor based in Shizuoka, Japan. She has made significant contributions to the field of pattern forming methods and resin compositions. With a total of 17 patents to her name, her work has had a substantial impact on the industry.

Latest Patents

Kana Fujii's latest patents include a pattern forming method that utilizes an actinic ray-sensitive or radiation-sensitive resin composition. This method involves forming a film from a resin composition that generates an acid upon irradiation, which subsequently decreases the solubility of the compound in an organic solvent. Another notable patent is a method of forming a pattern that ensures excellent sensitivity and resolving power, along with a resist composition that enhances the overall performance of the pattern forming process.

Career Highlights

Kana Fujii is currently employed at Fujifilm Corporation, where she continues to innovate and develop new technologies. Her expertise in resin compositions and pattern forming methods has positioned her as a key figure in her field.

Collaborations

Kana has collaborated with notable coworkers such as Sou Kamimura and Keita Kato, contributing to various projects that enhance the capabilities of their technologies.

Conclusion

Kana Fujii's innovative work in the field of pattern forming methods and resin compositions showcases her dedication to advancing technology. Her contributions continue to influence the industry and inspire future innovations.

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