The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Nov. 30, 2010
Applicants:
Tomotaka Tsuchimura, Shizuoka, JP;
Takayuki Ito, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Inventors:
Tomotaka Tsuchimura, Shizuoka, JP;
Takayuki Ito, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/027 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.