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Tomotaka Tsuchimura

USPTO Granted Patents = 73 (Patent Applications = 22)

EPO Patents = 20 (Patent Applications = 22)

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 154(Granted Patents)

Forward Citations (Not Self Cited) = 149(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Shizuoka-ken, JP (2004 - 2014)
Shizouka, JP (2014)
Shizuoka, JP (2005 - 2023)
Haibara-gun, JP (2009 - 2024)

Company Filing History:

Fuji Photo Film Company, Limited

Years Active: 2004-2024

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Areas of Expertise:

Actinic Ray-Sensitive Resin Composition

Photosensitive Composition

Resist Film

Pattern Forming Method

Chemical Amplification Resist Composition

Photomask

Electronic Device Manufacturing

Solid-State Image Sensor

Negative Resist Composition

Light-Shielding Color Filter

Polymerizable Composition

Crosslinkable Negative Chemical Amplification Resist

73 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11953829 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-04-09),

2. 11656548 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device (2023-05-23),

3. 11604414 - Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device (2023-03-14),

4. 11604412 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2023-03-14),

5. 11467489 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2022-10-11),

6. 10802399 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2020-10-13),

7. 10394127 - Pattern forming method and method for manufacturing electronic device (2019-08-27),

8. 10324374 - Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound (2019-06-18),

9. 10139727 - Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device (2018-11-27),

10. 10120281 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device (2018-11-06),

11. 10011576 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound (2018-07-03),

12. 10007180 - Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film (2018-06-26),

13. 9958775 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask (2018-05-01),

14. 9904167 - Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device (2018-02-27),

15. 9829796 - Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device (2017-11-28),

Title: The Innovative Mind of Tomotaka Tsuchimura

Introduction

Tomotaka Tsuchimura, a distinguished inventor located in Shizuoka, Japan, has made significant contributions to the field of resin compositions and electronic manufacturing technologies. With an impressive portfolio comprising 73 patents, Tsuchimura is recognized for his advancements in actinic ray-sensitive materials and their applications in photomasks and electronic devices.

Latest Patents

Among his latest patents, Tsuchimura has developed an actinic ray-sensitive or radiation-sensitive resin composition that includes a unique resin structure designed to enhance resist film performance. His innovations focus on a resin featuring a protected phenolic hydroxyl group and two distinct photoacid generators that create acids with specific pKa values, optimizing the sensitivity and pattern formation of resist films. His invention also involves methodologies for producing high-quality photomasks and manufacturing electronic devices, showcasing his versatility in addressing complex technological challenges.

Career Highlights

Throughout his career, Tsuchimura has been affiliated with prominent companies like Fujifilm Corporation and Fuji Photo Film Company, Limited, where he honed his expertise in material science and electronic applications. His work has led to the development of solutions that significantly improve pattern formation and overall device manufacturing efficiency.

Collaborations

Tomotaka Tsuchimura has collaborated with notable colleagues, including Takeshi Inasaki and Takayuki Ito, fostering a dynamic environment for innovation. These partnerships have propelled numerous research projects, leading to groundbreaking advancements in the field.

Conclusion

Tomotaka Tsuchimura continues to be a pivotal figure in the realm of innovations related to resin compositions and electronic device manufacturing. His extensive patent portfolio and collaborative efforts underscore his commitment to pushing the boundaries of technology and enhancing the capabilities of modern manufacturing processes.

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