The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Nov. 13, 2014
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Tomotaka Tsuchimura, Haibara-gun, JP;
Koutarou Takahashi, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01); G03F 1/20 (2012.01); G03F 1/22 (2012.01); G03F 1/00 (2012.01); G03F 1/50 (2012.01); G03F 1/56 (2012.01); C08F 212/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C08F 212/14 (2013.01); G03F 1/00 (2013.01); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 1/50 (2013.01); G03F 1/56 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2059 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01);
Abstract
A chemical amplification resist composition according to the present invention includes (A) a compound including a triarylsulfonium cation having one or more fluorine atoms and capable of generating an acid with a volume of 240 Åor higher by irradiation of active rays or radiation; and (B) a compound including a phenolic hydroxyl group.