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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10802399 B1

PDFFull Text
Date of Patent:
Oct. 13, 2020

Filed:

Aug. 23, 2018

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Ryo Nishio, Shizuoka, JP;

Masafumi Kojima, Shizuoka, JP;

Akiyoshi Goto, Shizuoka, JP;

Tomotaka Tsuchimura, Shizuoka, JP;

Michihiro Shirakawa, Shizuoka, JP;

Keita Kato, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); C07C 309/12 (2006.01); C07C 309/17 (2006.01); C07C 381/12 (2006.01); C07C 309/15 (2006.01); C07C 321/28 (2006.01); C07D 213/70 (2006.01); C07D 217/08 (2006.01); C07D 327/08 (2006.01); C07D 333/46 (2006.01); C07D 335/16 (2006.01); C07J 31/00 (2006.01); C07J 9/00 (2006.01); C07J 43/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/12 (2013.01); C07C 309/15 (2013.01); C07C 309/17 (2013.01); C07C 321/28 (2013.01); C07C 381/12 (2013.01); C07D 213/70 (2013.01); C07D 217/08 (2013.01); C07D 327/08 (2013.01); C07D 333/46 (2013.01); C07D 335/16 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/32 (2013.01); G03F 7/38 (2013.01); C07C 2603/74 (2017.05); C07J 9/005 (2013.01); C07J 31/006 (2013.01); C07J 43/003 (2013.01);
Abstract

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).

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