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For the Inventor, By the Inventor

Shizuoka, Japan

Michihiro Shirakawa

USPTO Granted Patents = 44 

 

Average Co-Inventor Count = 4.8

ph-index = 3

Forward Citations = 45(Granted Patents)


Location History:

  • Shizuoka, JP (2014 - 2024)
  • Haibara-gun, JP (2015 - 2024)

Company Filing History:

goldMedal44 out of 16,042 
 
Fujifilm Corporation
 patents

Years Active: 2014-2025

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44 patents (USPTO):
1. 12481215 - Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin (2025-11-25),
2. 12422752 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2025-09-23),
3. 12044967 - Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device (2024-07-23),
4. 12032290 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-07-09),
5. 11953829 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-04-09),
6. 11886113 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-01-30),
7. 11703758 - Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device (2023-07-18),
8. 11656548 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device (2023-05-23),
9. 11604414 - Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device (2023-03-14),
10. 11584810 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin (2023-02-21),
11. 11573491 - Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device (2023-02-07),
12. 11453734 - Treatment liquid and pattern forming method (2022-09-27),
13. 11281103 - Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device (2022-03-22),
14. 11249395 - Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film (2022-02-15),
15. 10859914 - Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development (2020-12-08),

Title: Michihiro Shirakawa - Innovative Inventor from Shizuoka, Japan

Introduction: Michihiro Shirakawa is a renowned inventor hailing from Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Shirakawa's latest patents include advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to creating a more efficient and sustainable future.

Career Highlights: With a career spanning over two decades, Shirakawa has worked with leading tech companies and research institutions to develop cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Shirakawa has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and creativity in all his projects.

Conclusion: Michihiro Shirakawa's passion for innovation and his relentless pursuit of excellence have solidified his position as a visionary inventor, shaping the landscape of technology for years to come.

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