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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12032290 B1

PDFFull Text
Date of Patent:
Jul. 09, 2024

Filed:

Jun. 11, 2021

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Daisuke Asakawa, Shizuoka, JP;

Takashi Kawashima, Shizuoka, JP;

Akiyoshi Goto, Shizuoka, JP;

Michihiro Shirakawa, Shizuoka, JP;

Kei Yamamoto, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

JCIPRNET

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/327 (2013.01); G03F 7/40 (2013.01);
Abstract

According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a resin P having a repeating unit represented by General Formula (P1) and a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

Find Patent Forward Citations

Asakawa, Daisuke. (2024). Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (U.S. Patent No. 12032290). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12032290

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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