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For the Inventor, By the Inventor

Shizuoka, Japan

Kei Yamamoto

USPTO Granted Patents = 33 

 

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 35(Granted Patents)


Location History:

  • Haibara-gun, JP (2009 - 2020)
  • Shizuoka, JP (2010 - 2024)

Company Filing History:

goldMedal33 out of 16,042 
 
Fujifilm Corporation
 patents

Years Active: 2009-2025

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33 patents (USPTO):
1. 12306538 - Treatment liquid and pattern forming method (2025-05-20),
2. 12242192 - Photosensitive resin composition, method for producing the same, resist film, pattern forming method, and method for manufacturing electronic device (2025-03-04),
3. 12235579 - Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device (2025-02-25),
4. 12216404 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2025-02-04),
5. 12032290 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-07-09),
6. 12032288 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device (2024-07-09),
7. 11042094 - Treatment liquid and pattern forming method (2021-06-22),
8. 10962884 - Treatment liquid and pattern forming method (2021-03-30),
9. 10852637 - Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film (2020-12-01),
10. 10761426 - Pattern forming method, method for manufacturing electronic device, and laminate (2020-09-01),
11. 10663864 - Pattern forming method, method for manufacturing electronic device, and laminate (2020-05-26),
12. 10578968 - Pattern forming method, resist pattern, and process for producing electronic device (2020-03-03),
13. 10261417 - Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device (2019-04-16),
14. 10175578 - Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device (2019-01-08),
15. 10114292 - Pattern forming method, resist pattern, and method for manufacturing electronic device (2018-10-30),

Title: Kei Yamamoto: Pioneering Inventor from Shizuoka, Japan

Introduction: Kei Yamamoto is a renowned inventor hailing from the picturesque city of Shizuoka, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Kei Yamamoto holds several patents in various technological domains, including robotics, artificial intelligence, and sustainable energy solutions. His recent patents focus on enhancing efficiency in manufacturing processes and improving the functionality of consumer electronics.

Career Highlights: Throughout his illustrious career, Kei Yamamoto has worked with leading tech companies to bring his inventions to life. His innovative ideas have revolutionized the way industries operate, leading to increased productivity and cost savings for businesses worldwide.

Collaborations: Kei Yamamoto has collaborated with top researchers and engineers from around the globe to further develop his inventions. His partnerships with academic institutions and research centers have resulted in cutting-edge technologies that have set new industry standards.

Conclusion: In conclusion, Kei Yamamoto's dedication to innovation and his relentless pursuit of excellence have solidified his reputation as a trailblazer in the world of technology. His inventive spirit continues to inspire the next generation of inventors to push the boundaries of what is possible in the ever-evolving tech landscape.

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