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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12235579 B1

PDFFull Text
Date of Patent:
Feb. 25, 2025

Filed:

Dec. 13, 2021

Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Keiyu Ou, Shizuoka, JP;

Naohiro Tango, Shizuoka, JP;

Kei Yamamoto, Shizuoka, JP;

Kazuhiro Marumo, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

JCIPRNET

Primary Examiner:

Sean M DeGuire

Assistant Examiner:

Andrew Preston Traywick

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/17 (2006.01); C07C 309/42 (2006.01); C07C 311/09 (2006.01); C07C 311/48 (2006.01); C07C 311/51 (2006.01); C07C 381/12 (2006.01); C07D 327/06 (2006.01); C07D 327/08 (2006.01); C07D 333/46 (2006.01); C07D 333/76 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/17 (2013.01); C07C 309/42 (2013.01); C07C 311/09 (2013.01); C07C 311/48 (2013.01); C07C 311/51 (2013.01); C07C 381/12 (2013.01); C07D 327/06 (2013.01); C07D 327/08 (2013.01); C07D 333/46 (2013.01); C07D 333/76 (2013.01); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 220/1812 (2020.02); C08F 220/1818 (2020.02); C08F 220/281 (2020.02); C08F 220/283 (2020.02); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C07C 2603/74 (2017.05);
Abstract

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

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