Location History:
- Haibara-gun, JP (2017 - 2020)
- Shizuoka, JP (2018 - 2021)
Company Filing History:
Years Active: 2017-2025
Title: Keiyu Ou: Innovator in Resin Composition Technology
Introduction
Keiyu Ou is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of resin composition technology, holding a total of 8 patents. His work focuses on methods for producing actinic ray-sensitive and radiation-sensitive resin compositions, which are crucial in various electronic device manufacturing processes.
Latest Patents
Keiyu Ou's latest patents include innovative methods for producing actinic ray-sensitive or radiation-sensitive resin compositions. One of his notable inventions is a method that involves a resin whose polarity increases due to acid decomposition. This method incorporates a compound that generates acid upon irradiation, along with a solvent. Another significant patent details an actinic ray-sensitive resin composition that includes a photoacid generator with a specific pKa, enhancing the performance of resist films and pattern forming methods in electronic devices.
Career Highlights
Keiyu Ou is currently employed at Fujifilm Corporation, where he continues to advance his research and development in resin technologies. His expertise has led to breakthroughs that improve the efficiency and effectiveness of electronic device manufacturing.
Collaborations
Some of his notable coworkers include Akiyoshi Goto and Keita Kato, who collaborate with him on various projects within Fujifilm Corporation.
Conclusion
Keiyu Ou's innovative work in resin composition technology has positioned him as a key figure in the field. His contributions are vital for the advancement of electronic device manufacturing processes.