Growing community of inventors

Shizuoka, Japan

Keiyu Ou

Average Co-Inventor Count = 4.73

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 3

Keiyu OuAkiyoshi Goto (6 patents)Keiyu OuKeita Kato (5 patents)Keiyu OuMasafumi Kojima (5 patents)Keiyu OuMichihiro Shirakawa (4 patents)Keiyu OuKei Yamamoto (2 patents)Keiyu OuKazuhiro Marumo (2 patents)Keiyu OuAkinori Shibuya (1 patent)Keiyu OuTakashi Kawashima (1 patent)Keiyu OuShohei Kataoka (1 patent)Keiyu OuNaohiro Tango (1 patent)Keiyu OuMinoru Uemura (1 patent)Keiyu OuNaoya Hatakeyama (1 patent)Keiyu OuKyohei Sakita (1 patent)Keiyu OuDaisuke Asakawa (1 patent)Keiyu OuKeiyu Ou (8 patents)Akiyoshi GotoAkiyoshi Goto (43 patents)Keita KatoKeita Kato (43 patents)Masafumi KojimaMasafumi Kojima (17 patents)Michihiro ShirakawaMichihiro Shirakawa (44 patents)Kei YamamotoKei Yamamoto (33 patents)Kazuhiro MarumoKazuhiro Marumo (5 patents)Akinori ShibuyaAkinori Shibuya (49 patents)Takashi KawashimaTakashi Kawashima (31 patents)Shohei KataokaShohei Kataoka (27 patents)Naohiro TangoNaohiro Tango (15 patents)Minoru UemuraMinoru Uemura (8 patents)Naoya HatakeyamaNaoya Hatakeyama (7 patents)Kyohei SakitaKyohei Sakita (6 patents)Daisuke AsakawaDaisuke Asakawa (4 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Fujifilm Corporation (8 from 16,042 patents)


8 patents:

1. 12235579 - Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

2. 12216404 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

3. 11073762 - Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator

4. 10859914 - Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development

5. 10649329 - Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

6. 10025186 - Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

7. 9952509 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

8. 9791777 - Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Please report any incorrect information to support@idiyas.com
idiyas.com
as of
12/4/2025
Loading…