The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Jul. 01, 2016
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Keita Kato, Shizuoka, JP;
Keiyu Ou, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Akiyoshi Goto, Shizuoka, JP;
Masafumi Kojima, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/11 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/11 (2013.01); G03F 7/2035 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01);
Abstract
The present invention relates to a pattern forming method including:
Kato, Keita. (2018). Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device (U.S. Patent No. 9952509). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9952509
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile