logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10025186 B1

PDFFull Text
Date of Patent:
Jul. 17, 2018

Filed:

Feb. 28, 2017

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Akiyoshi Goto, Haibara-gun, JP;

Masafumi Kojima, Haibara-gun, JP;

Keita Kato, Haibara-gun, JP;

Keiyu Ou, Haibara-gun, JP;

Michihiro Shirakawa, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); C08F 220/28 (2006.01); C08F 220/18 (2006.01); C08F 220/36 (2006.01); C08F 220/26 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 220/18 (2013.01); C08F 220/26 (2013.01); C08F 220/28 (2013.01); C08F 220/36 (2013.01); G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); G03F 7/32 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); C08F 2220/282 (2013.01); C08F 2220/283 (2013.01); C08F 2220/365 (2013.01);
Abstract

The present invention has an object to provide an active-light-sensitive or radiation-sensitive resin composition having high DOF and low LWR; a pattern forming method using the composition; and a method for manufacturing an electronic device. The active-light-sensitive or radiation-sensitive resin composition of the present invention includes a resin P and a compound that generates an acid upon irradiation with active light or radiation, in which the resin P has a repeating unit p1 and a repeating unit p2 represented by specific formulae, and the repeating unit p2 does not have a group in which a hydroxy group of a hydroxyadamantyl group is protected with a group that decomposes by the action of an acid to leave.

Find Patent Forward Citations

Loading…