The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Aug. 11, 2016
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Akiyoshi Goto, Haibara-gun, JP;
Masafumi Kojima, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Keita Kato, Haibara-gun, JP;
Keiyu Ou, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 220/28 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/26 (2006.01); C08F 22/10 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/68 (2006.01); C08F 224/00 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 22/10 (2013.01); C08F 220/68 (2013.01); C08F 224/00 (2013.01); G03F 7/038 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/2053 (2013.01); G03F 7/26 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01);
Abstract
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.