The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2026
Filed:
Jan. 25, 2023
Fujifilm Corporation, Tokyo, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Akiyoshi Goto, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray- or radiation-sensitive resin composition forms a pattern having excellent LWR performance. A resist film, pattern forming method, and method for manufacturing an electronic device employ the composition. The composition includes an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by an acid labile leaving group, and one or more compounds (PAGs) that generate an acid upon irradiation with actinic rays or radiation, selected from a compound (I) and a compound (II). The content of the acid-decomposable resin is 10% by mass or more and that of the PAGs is 10% by mass or more with respect to the total solids content. The acid-decomposable resin has a halogen atom in a repeating unit other than a repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.