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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11656548 B1

PDFFull Text
Date of Patent:
May. 23, 2023

Filed:

Jun. 18, 2020

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tomotaka Tsuchimura, Haibara-gun, JP;

Takashi Kawashima, Haibara-gun, JP;

Akihiro Kaneko, Haibara-gun, JP;

Michihiro Ogawa, Haibara-gun, JP;

Michihiro Shirakawa, Haibara-gun, JP;

Hajime Furutani, Haibara-gun, JP;

Kyohei Sakita, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 212/14 (2006.01); G03F 1/22 (2012.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08F 212/24 (2020.02); C08F 220/1804 (2020.02); C08F 220/1806 (2020.02); C08F 220/1811 (2020.02); C08F 220/281 (2020.02); C08F 220/282 (2020.02); G03F 1/22 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01);
Abstract

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y.

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