Haibara-gun, Japan

Hajime Furutani

This inventor holds 7 USPTO granted patents and 6 published patent applications and 2 EPO patents. Top assignee: Fujifilm Corporation. Active years: 2016-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Furutani. Retrieved from https://idiyas.com/inventor/hajime-furutani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Shizuoka, JP (2016 - 2023)
  • Haibara-gun, JP (2019 - 2024)

Company Filing History:


Years Active: 2016-2024

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7 patents (USPTO):Explore Patents

Title: **Hajime Furutani: Pioneering Innovator in Photosensitive Resins**

Introduction

Hajime Furutani, an accomplished inventor hailing from Haibara-gun, Japan, has made significant strides in the field of photosensitive materials. With a total of 7 patents to his name, Furutani's work primarily focuses on actinic ray-sensitive compositions and their applications in electronic device manufacturing.

Latest Patents

Among his latest inventions, Furutani developed an actinic ray-sensitive or radiation-sensitive resin composition. This innovative resin includes a repeating unit where a phenolic hydroxyl group is safeguarded by an acid-leaving group. Additionally, it incorporates a first photoacid generator that produces an acid with a pKa ranging from −2.00 to 2.00. Furthermore, he has delineated a second photoacid generator that generates a carboxylic acid with a pKa of at least 1.00.

Moreover, his research extends to a photosensitive composition designed for extreme ultraviolet (EUV) light, which consists of a specific resin combined with a photoacid generator. This composition adheres to rigorous requirements: it must have a defined A value and maintain a solid content concentration of 5.0% by mass or less, with the photoacid generator comprising 5% to 50% by mass of the total solid content.

Career Highlights

Furutani's professional journey is underscored by his affiliation with Fujifilm Corporation, a leading company in imaging and information solutions. His extensive work and expertise have positioned him as a key contributor in developing advanced materials essential for modern electronic devices.

Collaborations

Throughout his career, Hajime Furutani has collaborated with talented colleagues such as Michihiro Shirakawa and Takashi Kawashima. These partnerships have further enriched his research and innovation, aiding in the development of cutting-edge photosensitive materials.

Conclusion

Hajime Furutani's contributions to the field of photosensitive resins are noteworthy, as they not only reflect a commitment to innovation but also highlight the interconnections within the realm of technology and manufacturing processes. His prolific inventiveness continues to shape advancements in electronic devices, ensuring that Furutani remains a prominent figure in the landscape of modern invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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