Location History:
- Ashigarakami-gun, JP (2014 - 2016)
- Kanagawa, JP (2007 - 2017)
- Shizuoka, JP (2020)
- Haibara-gun, JP (2023)
Company Filing History:
Years Active: 2007-2023
Title: Ryo Nishio: Innovator in Actinic Ray-Sensitive Resin Technologies
Introduction
Ryo Nishio is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of actinic ray-sensitive resin compositions and their applications in electronic devices. With a total of 12 patents to his name, Nishio's work has had a considerable impact on the industry.
Latest Patents
Nishio's latest patents include innovations such as an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film, and a pattern forming method. His work also encompasses a method of manufacturing electronic devices. One of his notable inventions involves a resin that contains a repeating unit represented by a specific formula, which includes various chemical groups that enhance solubility in alkali developers. Additionally, he has developed a resin composition that increases solubility in aqueous alkali solutions upon acid action, featuring a compound that generates acid when exposed to actinic rays.
Career Highlights
Throughout his career, Ryo Nishio has worked with esteemed companies such as Fujifilm Corporation and UDC Ireland Limited. His experience in these organizations has allowed him to refine his expertise in resin technologies and electronic device manufacturing.
Collaborations
Nishio has collaborated with notable colleagues, including Naoyuki Hayashi and Akiyoshi Goto. Their combined efforts have contributed to advancements in the field of actinic ray-sensitive materials.
Conclusion
Ryo Nishio's innovative work in actinic ray-sensitive resin compositions and electronic device manufacturing showcases his significant contributions to technology. His patents reflect a deep understanding of chemical processes and their applications in modern electronics.