The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Jul. 08, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Tomotaka Tsuchimura, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 1/50 (2012.01); G03F 1/76 (2012.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0382 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01);
Abstract
A negative resist composition includes an onium salt compound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group.
Tsuchimura, Tomotaka. (2018). Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film (U.S. Patent No. 10007180). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10007180
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile