The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Mar. 25, 2016
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Shuhei Yamaguchi, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Natsumi Yokokawa, Shizuoka, JP;
Koutarou Takahashi, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Minato-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C07C 233/36 (2006.01); C07C 271/16 (2006.01); C07C 271/24 (2006.01); C07C 271/34 (2006.01); C07C 275/10 (2006.01); C07C 275/24 (2006.01); C07C 275/26 (2006.01); C07C 323/60 (2006.01); C07D 211/26 (2006.01); C07D 233/32 (2006.01); C07D 233/36 (2006.01); C07D 235/26 (2006.01); C07D 239/10 (2006.01); C07D 251/30 (2006.01); C07D 403/12 (2006.01); C07D 487/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07C 233/36 (2013.01); C07C 271/16 (2013.01); C07C 271/24 (2013.01); C07C 271/34 (2013.01); C07C 275/10 (2013.01); C07C 275/24 (2013.01); C07C 275/26 (2013.01); C07C 323/60 (2013.01); C07D 211/26 (2013.01); C07D 233/32 (2013.01); C07D 233/36 (2013.01); C07D 235/26 (2013.01); C07D 239/10 (2013.01); C07D 251/30 (2013.01); C07D 403/12 (2013.01); C07D 487/04 (2013.01); G03F 7/0382 (2013.01); G03F 7/0387 (2013.01); C07C 2601/14 (2017.05);
Abstract
There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).
Yamaguchi, Shuhei. (2019). Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound (U.S. Patent No. 10324374). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10324374
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile