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For the Inventor, By the Inventor

Shizuoka, Japan

Natsumi Yokokawa

This inventor holds 22 USPTO granted patents and 7 published patent applications and 5 EPO patents, primarily in Printing Technology. Top assignee: Fujifilm Corporation. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Natsumi Yokokawa. Retrieved from https://idiyas.com/inventor/natsumi-yokokawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 22 

% Patents Active = 95.5

 

Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 36(Granted Patents)


Location History:

  • Haibara-gun, JP (2017)
  • Ashigarakami-gun, JP (2021)
  • Shizuoka, JP (2015 - 2023)

Company Filing History:

goldMedal22 out of 16,996 
 
Fujifilm Corporation
 patents

Years Active: 2015-2025

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Areas of Expertise:
Planographic Printing
Lithographic Printing
Denture Base Coating
Actinic Ray-Sensitive Resin
Electronic Device Manufacturing
Pattern Formation
Resist Film
Coating Film-Bearing Denture
22 patents (USPTO):Explore Patents
1. 12187025 - On-machine development type planographic printing plate precursor, method for preparing planographic printing plate, and planographic printing method (2025-01-07),
2. 12157296 - On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method (2024-12-03),
3. 11635701 - Planographic printing plate precursor, method of preparing planographic printing plate, and planographic printing method (2023-04-25),
4. 10945928 - Denture base coating composition, coating film-bearing denture base, plate denture, and method for producing coating film-bearing denture base (2021-03-16),
5. 10526266 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound (2020-01-07),
6. 10444627 - Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device (2019-10-15),
7. 10324374 - Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound (2019-06-18),
8. 10120281 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device (2018-11-06),
9. 10011576 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound (2018-07-03),
10. 9904168 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device (2018-02-27),
11. 9798234 - Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask (2017-10-24),
12. 9766547 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device (2017-09-19),
13. 9651863 - Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device (2017-05-16),
14. 9551933 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device (2017-01-24),
15. 9527809 - Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device (2016-12-27),

Title: Natsumi Yokokawa - Innovative Inventor from Shizuoka

Introduction: Natsumi Yokokawa is a pioneering inventor hailing from Shizuoka, Japan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Natsumi Yokokawa holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing her versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Yokokawa has worked with leading tech companies and research institutions, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout her career, Natsumi Yokokawa has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all her projects.

Conclusion: Natsumi Yokokawa's dedication to pushing the boundaries of technology and her passion for creating solutions to complex problems make her a true trailblazer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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