The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Jan. 26, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Hiroo Takizawa, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Natsumi Yokokawa, Shizuoka, JP;
Wataru Nihashi, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/32 (2006.01); C08F 12/22 (2006.01); C08F 12/24 (2006.01); G03F 7/038 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08F 12/20 (2006.01); C08F 12/30 (2006.01); C08F 12/32 (2006.01); C09D 125/18 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 12/20 (2013.01); C08F 12/22 (2013.01); C08F 12/24 (2013.01); C08F 12/30 (2013.01); C08F 12/32 (2013.01); C08F 212/14 (2013.01); C08F 220/28 (2013.01); C09D 125/18 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); C08F 2220/281 (2013.01);
Abstract
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.