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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9551933 B1

PDFFull Text
Date of Patent:
Jan. 24, 2017

Filed:

Jan. 26, 2015

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Hiroo Takizawa, Shizuoka, JP;

Shuji Hirano, Shizuoka, JP;

Natsumi Yokokawa, Shizuoka, JP;

Wataru Nihashi, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Martin Angebranndt

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/32 (2006.01); C08F 12/22 (2006.01); C08F 12/24 (2006.01); G03F 7/038 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); C08F 12/20 (2006.01); C08F 12/30 (2006.01); C08F 12/32 (2006.01); C09D 125/18 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 12/20 (2013.01); C08F 12/22 (2013.01); C08F 12/24 (2013.01); C08F 12/30 (2013.01); C08F 12/32 (2013.01); C08F 212/14 (2013.01); C08F 220/28 (2013.01); C09D 125/18 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); C08F 2220/281 (2013.01);
Abstract

There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

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Takizawa, Hiroo. (2017). Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device (U.S. Patent No. 9551933). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9551933

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