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For the Inventor, By the Inventor

Shizuoka, Japan

Shuji Hirano

This inventor holds 51 USPTO granted patents and 17 published patent applications and 10 EPO patents, primarily in Resin Composition (CPC class G03F). Top assignee: Fujifilm Corporation. Active years: 2008-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuji Hirano. Retrieved from https://idiyas.com/inventor/shuji-hirano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 70.6

 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 77(Granted Patents)

Forward Citations (Not Self Cited) = 66(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Shizuoka-ken, JP (2014)
  • Haibara-gun, JP (2010 - 2019)
  • Shizuoka, JP (2008 - 2023)

Company Filing History:

goldMedal51 out of 16,949 
 
Fujifilm Corporation
 patents

Years Active: 2008-2023

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Areas of Expertise:
Resin Composition
Pattern Formation
Electronic Devices
Lithographic Printing
Photo Mask
Active Light-Sensitive
Chemical Amplification
Extreme Ultraviolet
Manufacturing Method
Mask Blank
Polymer Particle
Treatment Liquid
51 patents (USPTO):Explore Patents
1. 11640113 - Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device (2023-05-02),
2. 11590751 - Lithographic printing plate precursor, method for producing lithographic printing plate, polymer particle, and composition (2023-02-28),
3. 11331900 - Lithographic printing plate precursor and method for producing lithographic printing plate (2022-05-17),
4. 11042094 - Treatment liquid and pattern forming method (2021-06-22),
5. 11009791 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device (2021-05-18),
6. 10928727 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing (2021-02-23),
7. 10551739 - Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition (2020-02-04),
8. 10545405 - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device (2020-01-28),
9. 10488755 - Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method (2019-11-26),
10. 10444627 - Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device (2019-10-15),
11. 10423068 - Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device (2019-09-24),
12. 10031419 - Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device (2018-07-24),
13. 9766547 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device (2017-09-19),
14. 9760003 - Pattern forming method and actinic-ray- or radiation-sensitive resin composition (2017-09-12),
15. 9651863 - Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device (2017-05-16),

Title: Shuji Hirano: Pioneering Innovations in Actinic Ray-Sensitive Resin

Introduction:

Shuji Hirano, a prolific inventor based in Shizuoka, Japan, is renowned for his groundbreaking work in the field of actinic ray-sensitive or radiation-sensitive resin compositions. With a remarkable portfolio of 51 patents, Hirano continues to push the boundaries of innovation in the realm of electronic devices and pattern forming methods.

Latest Patents:

One of Hirano's latest patents includes an actinic ray-sensitive or radiation-sensitive resin composition featuring a specialized mix of resin, compounds, and organic solvents tailored for precise electronic device manufacturing processes. Additionally, his work on lithographic printing plate precursors showcases his expertise in polymer particles with hydrophilic and crosslinking structures.

Career Highlights:

Currently affiliated with Fujifilm Corporation, Hirano's contributions have propelled the company to the forefront of technological advancements in the industry. His wealth of experience and expertise have solidified his reputation as a pioneer in developing cutting-edge materials for electronic devices and lithographic printing processes.

Collaborations:

Throughout his career, Hirano has collaborated with esteemed colleagues such as Hiroo Takizawa and Hideaki Tsubaki. Together, they have synergized their talents to drive research and development initiatives, leading to the creation of innovative solutions that have revolutionized the field.

Conclusion:

In conclusion, Shuji Hirano's dedication to innovation and his relentless pursuit of excellence have cemented his legacy as a trailblazer in the realm of actinic ray-sensitive resins. His numerous patents and collaborative efforts stand as a testament to his profound impact on the industry, shaping the future of electronic device manufacturing and lithographic printing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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