Fujifilm Corporation

Shuji Hirano

Hiroo Takizawa

Hideaki Tsubaki

Wataru Nihashi

Natsumi Yokokawa

Kaoru Iwato

Shinichi Sugiyama

Hidenori Takahashi

Hiroshi Saegusa

Yusuke Iizuka

Kazuyoshi Mizutani

Toru Fujimori

Toru Tsuchihashi

Jiro Yokoyama

Takayuki Ito

Shuhei Yamaguchi

Hidehiro Mochizuki

Takeshi Kawabata

Kana Fujii

Takamitsu Tomiga

Akira Takada

Takayuki Kato

Tomotaka Tsuchimura

Kazuto Shimada

Akinori Shibuya

Keita Kato

Kei Yamamoto

Toshiaki Fukuhara

Toshihiro Usa

Sou Kamimura

Naoya Shimoju

Akihiro Kaneko

Koji Shirakawa

Kenjiro Araki

Ryo Nakamura

Koji Sonokawa

Kenji Sugiyama

Atsuyasu Nozaki

Fumihiro Yoshino

Masahiro Yoshidome

Koutarou Takahashi

Toshiya Takahashi

Naoki Inoue

Hajime Furutani

Katsuhiro Nishimaki

Kenichi Harada

Yuko Tada

Yuuya Miyagawa

Shinki Yamada

Yuya Miyakawa

Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, Rand Reach independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. Rrepresents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.) 

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

A lithographic printing plate precursor has an image-recording layer on a hydrophilic support, wherein the image-recording layer includes a polymer particle including an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A method for producing a lithographic printing plate uses the lithographic printing plate precursor. A polymer particle includes an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A composition includes the polymer particle.

Lithographic printing plate precursor, method for producing lithographic printing plate, polymer particle, and composition

Provided are a lithographic printing plate precursor having an image-recording layer on an aluminum support, in which the image-recording layer contains a polymerization initiator, an infrared absorber, a polymer particle, and a polymerizable compound, and the polymerizable compound has a) a molecular weight of 1,500 to 3,000, b) a double bond equivalent of 200 or less, and c) a CLog P of 9 or less and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used.

Lithographic printing plate precursor and method for producing lithographic printing plate

An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L/S pattern and the occurrence of omission failure in a resist C/H pattern. The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having a relative dielectric constant of 4.0 or less and a second organic solvent having a relative dielectric constant of 6.0 or more.

Treatment liquid and pattern forming method

An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155&#xb0; C. or higher, a compound (B) having a glass transition temperature of 150&#xb0; C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130&#xb0; C. to 170&#xb0; C.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing

Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.

Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition

Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

A pattern forming method including a step of coating a substrate with an actinic ray-sensitive or radiation-sensitive resin composition and forming an actinic ray-sensitive or radiation-sensitive film; a step of simultaneously irradiating the actinic ray-sensitive or radiation-sensitive film with a plurality of electron beams; and a step of developing the actinic ray-sensitive or radiation-sensitive film after the irradiation with electron beams is provided. The composition contains a resin (A), a photoacid generator (B), and an acid diffusion control agent (C) and a molar ratio (Qp) between the photoacid generator (B) and the acid diffusion control agent (C), which is represented by Equation (1) is 0.3 or greater.(molar ratio)=Acid diffusion control agent ()/Photoacid generator ()&#x2003;&#x2003;(1)

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

There are provided a pattern formation method, including:

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Provided are an active-light-sensitive or radiation-sensitive resin composition in which the sensitivity is excellent, and an active-light-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the active-light-sensitive or radiation-sensitive resin composition. The active-light-sensitive or radiation-sensitive resin composition contains a resin (Ab) whose polarity is changed by the action of an acid, and a compound that generates an acid upon irradiation with active light or radiation, in which the resin (Ab) includes a metal ion, and the metal type of the metal ion is at least one of metal types belonging to Groups 1 to 10 and 13 to 16 (here, excluding Mg and Cs).

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device

There is provided a pattern forming method, including: (1) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) exposing the film with actinic ray or radiation, (3) developing the film exposed by using a developer containing an organic solvent, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a repeating unit (R) with a structural moiety capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid, and (B) a solvent, and the developer contains an additive that causes at least one interaction selected from the group consisting of an ionic bond, a hydrogen bond, a chemical bond and a dipole interaction with respect to a polar group contained in the resin (A) after the exposing.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device

Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.

Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

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Shizuoka, Japan

Shuji Hirano