The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Oct. 23, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Hiroo Takizawa, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/039 (2006.01); C08F 220/28 (2006.01); C08F 20/28 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 20/28 (2013.01); C08F 220/28 (2013.01); G03F 7/004 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/32 (2013.01); C08F 2220/283 (2013.01);
Abstract
There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.